lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials
Silicon sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and deposited onto a substrate, creating a thin film.
| CICEL PVD vacuum coating target |
| Item | Purity | Density | Coating color | Shape | Standard size | Application |
| Titanium Aluminum(TiAl) Alloy target | 2N8-4N | 3.6-4.2 | Rose gold/coffee/champagne gold | cylinder/planar | (D)70/100*(H)100-2000mm | PVD decorative coating &hard coating |
| Pure chrome (Cr)target | 2N7-4N | 7.19 | gun grey/black | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Titanium(Ti) target | 2N8-4N | 4.51 | gold/rose gold/blue/rainbow/light black/gun grey | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Zirconium(Zr) target | 2N5-4N | 6.5 | light gold | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Aluminium(Al) target | 4N-5N | 2.7 | silver | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Nickel (Ni) target | 3N-4N | 8.9 | nickel | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Niobium (Nb) target | 3N | 8.57 | white | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Tantalum(Ta) target | 3N5 | 16.4 | black/pure | cylinder/planar | (D)70/100*(H)100-2000mm |
| Pure Molybdenum (Mo) target | 3N5 | 10.2 | black | cylinder/planar | (D)70/100*(H)100-2000mm |
| Remarks: Size can be customizaed according to specical requirements |
Silicon sputtering targets are made from high-purity silicon and are used in a variety of applications, including semiconductor manufacturing, solar cell production, and microelectronics. Some of the features and applications of silicon sputtering targets include:
High purity: Silicon sputtering targets are made from high-purity silicon, which makes them suitable for semiconductor and microelectronics applications.
Good thermal conductivity: Silicon has good thermal conductivity, which makes it useful for applications that require efficient heat dissipation.
Low sputtering yield: Silicon has a low sputtering yield, which makes it a good choice for applications that require precise control over film thickness.
High melting point: Silicon has a high melting point, which makes it an ideal choice for applications that require high-temperature resistance.
Photoelectric properties: Silicon has photoelectric properties, which makes it a popular choice for solar cell production.
Overall, silicon sputtering targets are a high-quality material that is well-suited for a wide range of applications that require a highly stable, thermally conductive, and photoelectric material.
Q1: Can I order a sample quantity ?
A1: Yes, we have no MOQ.
Q2: Can I add my logo on the boxes/cartons?
A2: Yes,OEM and ODM are available from us.
Q3: What are the benefits of being a distributor ?
A3: Special discount Marketing protection.
Q4: How does your factory control the quality of your products?
A4: 100% self-inspection before packing. Quality is the life of our factory, first, each raw materials, come to our factory, we will test it first, if qualified, we will process the manufacturing with this raw materials, if not, we will return it to our supplier, and after each manufacturing step, we will test it, and then all the manufacturing process finished, we will do the final test before the commodities left our factory.
Q5: Can we mix items in one 20ft container?
A5: Yes.
Q6: Can I have a visit to your factory before the order?
A6: Sure,welcome your visit of factory.
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Lab Equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Images
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